Epitaxial Growth Of Peculiar Gesn And Sisn Nanostructures Using A Sn Island Array As A Seed

APPLIED SURFACE SCIENCE(2021)

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摘要
The regularities of the GeSn and SiSn nanostructure formation on Si and Ge(1 0 0) substrates on the vapor?liquidcrystal mechanism were studied. It was shown that either thread-like nanostructures or mushroom-shaped islands containing truncated icosahedrons in the upper Ge part can appear on a Ge(1 0 0) substrate. A Sn-rich island array with faceted silicon pedestals was formed during the Si growth over the Sn island array obtained on a Si(1 0 0) substrate. Two characteristic island shapes with lenticular and conical shapes were found by transmission electron microscopy (TEM). Lenticular islands consist of ?-Sn and are buried in Si, while coneshaped islands, in addition to ?-Sn, contain a SiSn solid solution region in their lower part. The Sn content, estimated from interplanar spacing changes, is about 5%. The region between the islands also contains the SiSn solid solution layer. In addition, it has a nanostructured faceted morphology. The photoluminescence signal from structures with the SiSn island array with silicon pedestals was observed in the region from 1.25 to 3 ?m with a maximum of about 2 ?m. The nanostructured faceted surface formation was studied by self-organization. The appearance of GeSn cross-structures was revealed during the GeSn deposition on a nanostructured faceted surface. The near-infrared photoluminescence increase by a factor of 3.5 was demonstrated in the samples with cross-structures.
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关键词
GeSn, SiSn, Molecular-beam epitaxy, Nanostructure, Morphology, Photoluminescence
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