Stress balancing to mitigate NBTI effects in register files

DSN '13 Proceedings of the 2013 43rd Annual IEEE/IFIP International Conference on Dependable Systems and Networks (DSN)(2013)

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摘要
Negative Bias Temperature Instability (NBTI) is considered one of the major reliability concerns of transistors in current and upcoming technology nodes and a main cause of their diminished lifetime. We propose a new means to mitigate the effects of NBTI on SRAM-based register files, which are particularly vulnerable due to their small structure size and are under continuous voltage stress for prolonged intervals. The conducted results from our technology simulator demonstrate the severity of NBTI effects on the SRAM cells - especially when process variation is taken into account. Based on the presented analysis, we show that NBTI stress in different registers needs to be tackled using different strategies corresponding to their access patterns. To this end, we propose to selectively increase the resilience of individual registers against NBTI. Our technique balances the gate voltage stress of the two PMOS transistors of an SRAM cell such that both are under stress for approximately the same amount of time during operation - thereby minimizing the deleterious effects of NBTI. We present mitigation implementations in both hardware and in software along with the incurred overhead. Through a wide range of applications we can show that our technique reduces the NBTI-induced reliability degradation by 35% on average. This is 22% better than current State-of-the-Art.
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关键词
MOSFET,SRAM chips,negative bias temperature instability,semiconductor device reliability,NBTI effect mitigation,NBTI stress,NBTI- induced reliability degradation,PMOS transistor reliability,SRAM cell,SRAM cells,SRAM-based register files,continuous voltage stress,gate voltage stress balancing,negative bias temperature instability,technology simulator,Aging,Embedded system,Microarchitecture,NBTI,Register File,Reliability
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