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排名必读论文期刊顶会热点AI 简史溯源树小脉星探人才迁徙塔尖人才国防情报追踪开源工具智慧手语
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论文共 123 篇作者统计合作学者相似作者

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ArFi speckle reduction and impact on local CDU
Will Conley,Stephen Hsu, Michael Crouse, Dylan Martin, Rajasekhar Rao, Natalllia Karlitskaya, Dirk van Leuken, Jan Baselmans, Marieke van Veen, Edwin de Jong, Birgitt Hepp,Rasmus Nielsen,
Optical and EUV Nanolithography XXXVII (2024)
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Improving EUV sub-40nm via single patterning using wavefront and pupil co-optimization
Soojung Kim, No Young Chung, Kwangseok Maeng, Hyunjae Cho, Jerry Lim, Hyungrok Jang, Jae Hyoung Kim, Insung Kim,Eelco van Setten, Hidde Keizers, Ajinkya Patil, Steven Beekmans,
Optical and EUV Nanolithography XXXVII (2024)
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A novel solution on KrF pixel layer with thick photo resist (PR) by single exposure multi-focal imaging (MFI) technique
Zhenhai Yao, Lequn Jin, Yuhua Li, Maoqun Jiang, Fabin Huang, Min Fang, Xichen Sheng,Rongkuo Zhao, Michael Crouse,Chris Kaplan,Dongqing Zhang, Dongxiang Shi,
Optical and EUV Nanolithography XXXV (2022)
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Mask and illumination optimization for low-k1 EUV lithography
Dong-Seok Nam,Jung-Hoon Ser, Nakgeuon Seong, Xiaoyang Li,Stephen Hsu, Anthony Yen
Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology (2022)
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Study influential factors on lithography imaging in implant layers with wafer topography
Jinfeng Mu, Anton van Oosten, Derek Shi, Chaoqun Guo, Sam Liu,Stephen Hsu
2022 International Workshop on Advanced Patterning Solutions (IWAPS)pp.1-4, (2022)
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Extreme ultraviolet scanner with high numerical aperture: obscuration and wavefront description
Laurens de Winter,Timur Tudorovskiy, Jan van Schoot, Kars Troost, Erwin Stinstra,Stephen Hsu, Toralf Gruner,Juergen Mueller, Ruediger Mack,Bartosz Bilski,Joerg Zimmermann,Paul Graeupner
Journal of Micro/Nanopatterning, Materials, and Metrologyno. 02 (2022)
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Optimizations aspects for EUV low-k1 logic with the low-n mask
M.-Claire van Lare,Stephen Hsu,Jo Finders
International Conference on Extreme Ultraviolet Lithography 2021 (2021): 103-115
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Full chip computational lithography for KrF multi-focal imaging (MFI) (Conference Presentation)
Will Conley, Vince Plachecki,Stephen Hsu, Michael Crouse,Rongkuo Zhao, John He,Pieter Scheijgrond,Dezheng Sun, Xiaoyang Li,Dongqing Zhang,Ming-Chun Tien, Jun Ye,
Optical Microlithography XXXIV (2021)
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